Boron is a metalloid with an atomic number of 5. In its high-purity form, boron appears as a dark brown or black powder or as a dark, brittle crystalline metal.
Application
Boron is commonly used as a doping agent in the silicon etching of microprocessors. Semiconductor fabrication (FAB) companies have determined that any boron remaining in ultrapure water is detrimental to product yield. Boron can be found in water streams and must be removed from potable groundwater resources and Ultrapure water.
Challenges
In potable and groundwater, high levels of boron can cause dermatitis and gastrointestinal problems. Within the semiconductor industry, water must be treated to meet rigorous specifications to ensure the quality and efficiency of the manufacturing process.
Solutions
Resin technology is used for three relevant applications.
Removal from Potable and Groundwater
While some areas of the United States have high concentrations of boron in their soil, it is also found in wastewater and municipal sewage and, therefore, finds its way into the drinking water supply.
Purolite™ S108, with methyl-glucamine functionality, can be used to selectively remove boron from potable and groundwater used in agriculture/horticulture. It is also used to remove boron in seawater desalination.
For more information, visit
Potable and Groundwater Products.
Removal from Demineralized Process Water
Dissolved solids must be removed from feed water and process streams to maintain industrial water treatment efficiency. Boron is one element found in pre-treated water that must be removed. Standard strong base anion resins in the hydroxide form will remove boron in ion exchange demineralization systems.
A permeate polishing system utilizing
Purolite MB400 or
Purolite MB600 mixed bed resins can remove boron and dissolved carbon dioxide from the reverse osmosis system, which has low removal levels.
For more information, visit
Mixed Bed Resin Products.
Removal from Ultrapure Water
Ultrapure water must reach an ideal purity level with a resistivity of 18.2 MΩ.cm, TOC < 10 ppb, and bacterial count <10 CFU/ml. Boron is also removed to create high-purity water used in semiconductor manufacturing. Ultrapure water is the key to rinsing wafers after chemicals are applied to them. Water impurities, such as boron, can cause product contamination or impact semiconductor efficiency.
To achieve the necessary boron removal requirements,
Purolite UltraClean™ UCW1080 is used in the Ultrapure water loop to maintain boron levels at < 50 ppt.
For more information, visit
UltraClean Products for UltraPure Water.
